In the current life, some children may suffer from cranial defects after craniotomy due to car accidents, impacts, intracranial diseases, etc. This is a very scary thing in the eyes of a child. This is a very scary thing in the eyes of the child, the skull defect will have a great impact on his psychology, so that he can’t play with children confidently, resulting in a serious inferiority complex, which is not conducive to the healthy physical and mental development of children, in addition, a long period of time of defective skull will also cause an imbalance in the intracranial pressure, which will lead to dizziness, epilepsy and other symptoms. Therefore, the repair of the skull is necessary and important. But for the repair material is the most important thing to repair the skull, most of the hospitals use titanium mesh as the repair material, the choice of repair material is also an important indicator when choosing hospitals, the most ideal repair material should be used after the body will not have any rejection, and the use of comfortable, there will not be any foreign body sensation. However, the current titanium mesh has been shown to cause different degrees of rejection in some patients, and some patients have even experienced pain at the edges and exposure of the material. Is there not a more perfect material? In fact, the current new polyether ether ketone material is a quite ideal repair material. The reason why polyether ether ketone material, also commonly known as peek material is called the most ideal material is that it has advantages that are incomparable to other materials. Its strength is very good, strong resistance to blows, can well protect the brain tissue; it has excellent resistance to high temperature, chemical resistance and fatigue resistance, biocompatibility, the human body in the use of the basic will not have a reaction, at present, there have been a lot of cranial defects patients with peek material to repair the defective cranium, and the effect of the surgery are very satisfied.